Study of Photo-Fenton Process for Treatment of Pharmaceuticals: Kinetic Modeling and Optimization
Keywords:
kinetic, micropolluants, TOCAbstract
The scientific community's interest in the study of micropollutants is very recent and increases every day, since these chemicals cause important changes in the environment, affecting the health of animals and humans. It is important to provide techniques capable of degrading these compounds such as the advanced oxidation processes. The present work aims to propose a kinetic model (based on the mineralization of TOC) for the treatment of aqueous solutions with: acetylsalicylic acid (ASA), diclofenac and paracetamol. The analysis of the total organic carbon showed a conversion of 84.84% by combining UV/H2O2. The kinetic model was developed to UV/H2O2 process. The kinetic model adopted to describe the profile of the concentration of residual TOC was grouped into two groups (refractory and non refractory compounds) and achieved satisfactorily represent the profile of the residual fraction of the organic compounds analyzed. For the type described a linear, regression was performed on the basis ofexperimental data obtaining a R2 value equal to 0.97874.Downloads
Published
2013-09-22
How to Cite
NAPOLEÃO, D. C., BRANDÃO, Y. B., BENACHOUR, M., & SILVA, V. L. (2013). Study of Photo-Fenton Process for Treatment of Pharmaceuticals: Kinetic Modeling and Optimization. Scientia Plena, 9(9). Retrieved from https://scientiaplena.org.br/sp/article/view/1214
Issue
Section
Articles
License
Authors who publish with this journal agree to the following terms:
- Authors retain copyright and grant the journal right of first publication with the work simultaneously licensed under a Creative Commons Attribution License that allows others to share the work with an acknowledgement of the work's authorship and initial publication in this journal.
- Authors are able to enter into separate, additional contractual arrangements for the non-exclusive distribution of the journal's published version of the work (e.g., post it to an institutional repository or publish it in a book), with an acknowledgement of its initial publication in this journal.
- Authors are permitted and encouraged to post their work online (e.g., in institutional repositories or on their website) prior to and during the submission process, as it can lead to productive exchanges, as well as earlier and greater citation of published work