Random deposition of particles with different angles

Autores

  • Amanda Carvalho Augusto Vilas Boas Universidade Federal do Sul da Bahia
  • Fabricio Luchesi Forgerini Universidade Federal do Sul da Bahia Instituto de Humanidades, Artes e Ciências - IHAC Campus Paulo Freire Teixeira de Freitas - BA http://orcid.org/0000-0002-3054-2009

DOI:

https://doi.org/10.14808/sci.plena.2017.114801

Palavras-chave:

stochastic growth equation, Monte Carlo simulations, thin-films

Resumo

In this work we study numerically the effects of the angle of deposition of particles in the growth process of a thin-film generated by aggregation of particles added at random. The particles are aggregated in a random position of an initially flat surface and with a given angle distribution. This process gives rise to a rough interface after some time of deposition. We performed Monte Carlo simulations and, by changing the angle of deposition, we observed different results from the random deposition (RD) model. We measured the usual scaling exponents, namely, the roughness () and the growth () exponents. Our results show that the particles added non-perpendicularly to the substrate, can change the behavior in a discrete atomistic random deposition model. When particles are deposited with an angle of 45° in relation to the surface, the values of and  are observed in the Random Deposition model. We also propose an analytic approach, using a differential stochastic equation to analyze the growth process evolution, and our theoretical results corroborate the computer simulations.

Biografia do Autor

Fabricio Luchesi Forgerini, Universidade Federal do Sul da Bahia Instituto de Humanidades, Artes e Ciências - IHAC Campus Paulo Freire Teixeira de Freitas - BA

Decano (Diretor) do IHAC no Campus Paulo Freire, da UFSB. Professor Adjunto III, graduado e mestre em Física pela Universidade Federal de Santa Catarina e Doutor em Física pela Universidade de Aveiro - Portugal, com título revalidado pela UNICAMP.

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Publicado

2017-12-14